Hae Won completed the MS program by successfully defending his thesis on May 9. Great job, and good luck!
Hugh wins fellowship
Hugh has won the Provost Diversity Fellowship for spring 2018. Congratulations!
Congratulations, Hugh
In December 2017:
Hugh passed his A exam and is now a PhD candidate.
New article in JVST A
In November 2017, “Design and characterization of a microreactor for spatially confined atomic layer deposition and in situ UHV surface analysis” was published in JVST A with lead author Jiun-Ruey Chen, found here.
Congratulations, Jiun-Ruey!
Jiun-Ruey Chen passed his PhD B exam in July 2017, and is now working at Intel. Congratulations and good luck!
Big news for 2 ERG members!
In June 2017:
Colleen took a road trip from NY to Portland, OR for a summer internship at Lam Research Corporation.
Hugh won the Technology Commercialization Fellowship for summer and fall 2017, through which he will explore the commercialization process for lithium-metal battery research from the Archer group.
3 recently published articles
The ERG recently published two articles in The Journal of Chemical Physics and one in The Journal of Physical Chemistry C:
“Who’s on first? Tracking in real time the growth of multiple crystalline phases of an organic semiconductor: Tetracene on SiO2” in December 2016 with lead author Rambert Nahm, found here.
“Preface: Special Topic on Atomic and Molecular Layer Processing: Deposition, Patterning, and Etching” in February 2017 by Prof. Jim Engstrom and Prof. Andrew Kummel of UCSD, found here.
“Faster Is Smoother and So Is Lower Temperature: The Curious Case of Thin Film Growth of Tetracene on SiO2” in April 2017 with lead author Rambert Nahm, found here.
Congratulations, Taewon!
Taewon completed his MS defense in November 2016 and matriculated into the PhD program. Congratulations and we are happy you are continuing with us!
Welcome to our new members!
The ERG gained two new members in October 2016: Colleen Lawlor from RIT in the PhD program, and Hae Won Sohn from Rice University in the MS program.
Congratulations, Rambert!
Rambert Nahm passed his PhD B exam in July 2016, and is now working at Intel. Congratulations!
ERG publishes 2 new articles
Two articles by the ERG were published in The Journal of Physical Chemistry C in March 2016:
“When the Sequence of Thin Film Deposition Matters: Examination of Organic-on-Organic Heterostructure Formation Using Molecular Beam Techniques and in Situ Real Time X-ray Synchrotron Radiation” with lead author Ed Kish, found here.
“Unexpected Effects of the Rate of Deposition on the Mode of Growth and Morphology of Thin Films of Tetracene Grown on SiO2” with lead author Rambert Nahm, found here.
Jiun-Ruey passes A exam and newly published article
Jiun-Ruey Chen recently passed his Admission to Candidacy exam (A exam) and is now a PhD candidate! Congratulations!
A new article from ERG, titled: “Effect of Substrate Composition on Atomic Layer Deposition Using Self-Assembled Monolayers as Blocking Layers”, has been published in JVST A. Wenyu Zhang is the lead author. You can find the paper here.