ERG publishes 2 new articles

Two articles by the ERG were published in The Journal of Physical Chemistry C in March 2016:

“When the Sequence of Thin Film Deposition Matters: Examination of Organic-on-Organic Heterostructure Formation Using Molecular Beam Techniques and in Situ Real Time X-ray Synchrotron Radiation” with lead author Ed Kish, found here.

“Unexpected Effects of the Rate of Deposition on the Mode of Growth and Morphology of Thin Films of Tetracene Grown on SiO2” with lead author Rambert Nahm, found here.

Welcome, Hugh and Taewon!

Welcome to our two newest members, Hugh and Taewon! Hugh joins us from SUNY Stony Brook, and Taewon from University of Minnesota.

Also, congratulations to our most recent grad, Ed Kish! He graduated earlier this year with his PhD and now works at RSR Technologies.

ERG at ALD 2013 (San Diego)!

ERG is in San Diego at ALD 2013! You might have caught Prof. Engstrom’s short workshop presentation on the characterization of ultra-thin ALD films on Sunday, July 28.

On July 30 at 11 am in Session B, you can catch Wenyu Zhang’s presentation on “The Effect of Substrate Composition on Selective Area Atomic Layer Deposition Using Self-Assembled Monolayers as Blocking Layers”.

We have also recently published a paper on “Probing ultrathin film continuity and interface abruptness with x-ray photoelectron spectroscopy and low-energy ion scattering”. This Wenyu’s first first-authored paper! Congrats! You can find the paper here.