Taewon completed his MS defense in November 2016 and matriculated into the PhD program. Congratulations and we are happy you are continuing with us!

The ERG gained two new members in October 2016: Colleen Lawlor from RIT in the PhD program, and Hae Won Sohn from Rice University in the MS program.

Rambert Nahm passed his PhD B exam in July 2016, and is now working at Intel. Congratulations!

Two articles by the ERG were published in The Journal of Physical Chemistry C in March 2016:

“When the Sequence of Thin Film Deposition Matters: Examination of Organic-on-Organic Heterostructure Formation Using Molecular Beam Techniques and in Situ Real Time X-ray Synchrotron Radiation” with lead author Ed Kish, found here.

“Unexpected Effects of the Rate of Deposition on the Mode of Growth and Morphology of Thin Films of Tetracene Grown on SiO₂” with lead author Rambert Nahm, found here.

Jiun-Ruey Chen recently passed his Admission to Candidacy exam (A exam) and is now a PhD candidate! Congratulations!

A new article from ERG, titled: “Effect of Substrate Composition on Atomic Layer Deposition Using Self-Assembled Monolayers as Blocking Layers”, has been published in JVST A. Wenyu Zhang is the lead author. You can find the paper here.

Welcome to our two newest members, Hugh and Taewon! Hugh joins us from SUNY Stony Brook, and Taewon from University of Minnesota.

Also, congratulations to our most recent grad, Ed Kish! He graduated earlier this year with his PhD and now works at RSR Technologies.

Our website is moving to a new address!

http://engstromgroup.cbe.cornell.edu/

Our recent publication, entitled “Probing ultrathin film continuity and interface abruptness with x-ray photoelectron spectroscopy and low-energy ion scattering,” was the second highest read/downloaded paper of JVST A in July 2013. You can find the paper here.

Congratulations to Wenyu Zhang for winning the Student Award for best presentation of graduate research in Atomic Layer Deposition at ALD 2013!

ERG is in San Diego at ALD 2013! You might have caught Prof. Engstrom’s short workshop presentation on the characterization of ultra-thin ALD films on Sunday, July 28.

On July 30 at 11 am in Session B, you can catch Wenyu Zhang’s presentation on “The Effect of Substrate Composition on Selective Area Atomic Layer Deposition Using Self-Assembled Monolayers as Blocking Layers”.

We have also recently published a paper on “Probing ultrathin film continuity and interface abruptness with x-ray photoelectron spectroscopy and low-energy ion scattering”. This Wenyu’s first first-authored paper! Congrats! You can find the paper here.

The group welcomes Jade Noble as the newest member of the Engstrom Research Group! She worked with the group as an NNIN REU student in the summer of 2011 and is now joining ERG as a PhD student in Chemical and Biomolecular Engineering.